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表面物理与表面分析PDF|Epub|txt|kindle电子书版本网盘下载
- 丁训民，杨新菊，王讯编著 著
- 出版社： 上海：复旦大学出版社
- ISBN：7309041682
- 出版时间：2004
- 标注页数：279页
- 文件大小：101MB
- 文件页数：40053937页
- 主题词：表面物理学－研究生－教材；表面分析－研究生－教材
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图书目录
Chapter 1 Introduction1
1.1 Characteristics of Surface1
1.1.1 Unique Characteristics of Surface2
1.1.2 The Subjects of Surface Physics4
1.2 Methodology of Surface Science7
1.2.1 General Idea7
1.2.2 Category of Surface analytical Technologies10
1.3 Electron Spectroscopy12
1.3.1 Energy Distribution of Secondary Electrons12
1.3.2 Mean Free Path and Surface Sensitivity13
1.4 Surface Cleaning Processes16
1.4.1 Clean Surface versus Native Surface16
1.4.2 Methods of Preparing Clean Surfaces17
Chapter 2 Surface Atomic Structures20
2.1 Two Dimensional Crystallography21
2.1.1 Periodicity and Symmetry of Surface Unit Cell21
2.1.2 Point Group and Plane Group23
2.1.3 Nomenclature of Surface Structures25
2.1.4 Reciprocal Lattice28
2.2 Atomic Structures of Ideal Surfaces30
2.2.1 Surface Structures of Metals30
2.2.2 Surfaces of Crystalline Compounds and Alloys34
2.3 Surface Relaxation and Reconstruction35
2.3.1 Surface Relaxation35
2.3.2 Surface reconstruction39
2.4 Surface Defects50
2.4.1 Point Defects51
2.4.2 Dislocations52
2.4.3 Atomic Steps53
Chapter 3 Low Energy Electron Diffraction and Reflection High Energy Electron Diffraction57
3.1 Principles58
3.1.1 Brief of the Diffraction in Three Dimensions59
3.1.2 Electron Diffraction in Two Dimensions62
3.2 Apparatus64
3.2.1 LEED Optics64
3.2.2 Spot Profile Analysis LEED66
3.2.3 Measurement of Ⅰ-Ⅴ Curves68
3.2.4 Shield and Compensation of Stray Electromagnetic Field69
3.3 Pattern Recognition70
3.3.1 Diffraction Orders70
3.3.2 Pattern Transform72
3.3.3 LEED Patterns of Stepped Surfaces75
3.4 LEED Ⅰ-Ⅴ79
3.4.1 Experimental and Theoretical Ⅰ-Ⅴ Curves79
3.4.2 R Factor81
3.5 Reflection High Energy Electron Diffraction85
3.5.1 Principle85
3.5.2 RHEED Analysis88
3.5.3 RHEED Intensity Oscillation92
3.6 Appendix94
3.6.1 Compilation of LEED Patterns94
3.6.2 Compilation of RHEED Patterns102
Chapter 4 Scanning Probe Microscopy107
4.1 General Concept108
4.2 Scanning Tunneling Microscopy110
4.2.1 Basic Principle110
4.2.2 Apparatus112
4.2.3 Working Modes and Conditions117
4.2.4 STM Imaging119
4.2.5 Scanning Tunneling Spectroscopy123
4.2.6 STM Nanofabrication and Atom Manipulation125
4.3 Atomic Force Microscopy127
4.3.1 Principle127
4.3.2 Apparatus130
4.3.3 Working Modes ofAFM134
4.3.4 Lateral Force Microscopy138
4.4 Other Types of Scanning Probe Microscopy140
4.4.1 Scanning Magnetic Force Microscopy140
4.4.2 Scanning Near-field Optical Microscopy142
4.4.3 Ballistic Electron Emission Microscopy145
Chapter 5 Surface Electronic States149
5.1 Existence of Localized Electronic States at Surfaces149
5.1.1 Bulk States and Surface States149
5.1.2 Surface States in One-dimensional Models152
5.2 Surface Dangling Bond States158
5.2.1 Dangling Bond and Its Hybrid158
5.2.2 Dangling Bond States at Reconstructed Surfaces160
5.2.3 Dangling Bond States and Fermi Level Pinning163
5.3 Adsorbate Induced Electronic States164
5.3.1 Adsorption Phenomena165
5.3.2 Adsorbate-induced Work Function Changes169
5.3.3 Metal-induced Gap States(MIGS)173
Chapter 6 Auger Electron Spectroscopy175
6.1 Principle176
6.1.1 Auger Process176
6.1.2 Energy of Auger Electron178
6.1.3 Yield and Cross-section180
6.1.4 Differential Spectra and Count Spectra181
6.2 Apparatus and Experimental Methods183
6.2.1 Experimental Setup183
6.2.2 Experimental Conditions186
6.3 Qualitative and Quantitative Analysis189
6.3.1 Element Identification189
6.3.2 Quantitative Composition Analysis190
6.3.3 Chemical Analysis193
6.4 Depth Profiling194
6.4.1 Purpose and Methods194
6.4.2 Profile ofCompositions196
6.4.3 Interface Location198
6.5 Scanning Auger Microscopy201
6.5.1 Line-scan202
6.5.2 Auger Map202
6.5.3 Spatial Resolution203
Chapter 7 X-ray Photoelectron Spectroscopy205
7.1 Principle206
7.1.1 Three Step Process of Photoemission206
7.1.2 Binding Energy208
7.2 Apparatus209
7.2.1 X-ray Sources210
7.2.2 Electron Energy Analyzer213
7.2.3 Detectors215
7.3 Qualitative Analysis215
7.3.1 Energy Calibration215
7.3.2 Peak Discrimination217
7.3.3 Element Identification222
7.4 Quantitative Analysis223
7.4.1 Quantification Methods223
7.4.2 Background Subtraction224
7.4.3 Peak Decomposition226
7.4.4 Depth Profile and Depth Information229
7.5 Chemical States Studies231
7.5.1 Chemical Shift231
7.5.2 Charging Effect and Compensation233
7.6 Appendix-Electron binding energies of elements in periodic table235
Chapter 8 Ultra-Violet Photoelectron Spectroscopy240
8.1 Principle240
8.1.1 UPS versus XPS240
8.1.2 Basic Process241
8.1.3 Selection Rules and Wavefunction Symmetry245
8.2 Light Sources246
8.2.1 Discharge Lamp246
8.2.2 Monochromator and Polarizer248
8.2.3 Special Synchrotron Radiation Sources251
8.3 Applications254
8.3.1 Identification of Surface Electronic States254
8.3.2 Mapping of Surface and Bulk Bands258
8.3.3 Identification of Adsorbates:Species and Adsorption Sites263
References268
Index274